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1.
掺杂镧铒对纳米二氧化钛薄膜光催化性能的影响   总被引:1,自引:0,他引:1  
钛酸四丁酯作为前驱体,溶胶凝胶法经煅烧在玻璃载体上制备了稀土离子(La^3+、Er^3+)掺杂的纳米TiO2薄膜光催化剂.以罗丹明B作为有机污染物,可见吸光光度法测定太阳光降解作用的结果表明,未掺杂稀土离子的TiO2薄膜光催化效果差,掺杂稀土离子的纳米TiO2薄膜具有亲水性和更好的光催化活性.稀土离子掺杂光催化效果La^3+〉Er^3+,当摩尔比Ti^4+:La^3+为0.003时光催化效果最好,对罗丹明B的降解率为87.6%.  相似文献   

2.
采用sol-gel法制备了锐钛矿型TiO2薄膜与Ni2+掺杂TiO2薄膜。通过XRD、AFM表征了薄膜的晶相和形貌特征,用接触角测定仪测定接触角以评估薄膜的亲水性,以甲基橙作为有机污染物研究了薄膜的光催化性能。实验结果发现:少量Ni2+掺杂提高了TiO2薄膜的亲水性和光致亲水性。但Ni2+掺杂却使TiO2光催化性能有所降低。结果表明,TiO2薄膜表面的光致亲水性与光催化特性无正相关性。  相似文献   

3.
用传统的溶胶-凝胶法、改进的溶胶-水热法制备了纳米TiO2和掺杂纳米TiO2,通过对甲基橙有机废水的光催化降解模拟实验,比较不同产品的光催化性能,发现改进的溶胶-水热法优于传统的溶胶-凝胶法,掺杂纳米TiO2优于纯纳米TiO2.  相似文献   

4.
以钛酸丁酯为前驱体,采用溶胶-凝胶法在玻片上制备TiO2半导体薄膜,以微孔敏化的方法将CdS引入到TiO2纳米粒子的表面,形成的CdS-TiO2半导体复合膜用于处理煤气发生站废水中的污染物.研究了CdS-TiO2复合半导体材料光催化降解作用机理和CdS含量对TiO2半导体材料光催化降解活性的影响.  相似文献   

5.
采用sol-gel法制备了锐钛矿型TiO2薄膜与Ni2+掺杂TiO2薄膜.通过XKD、APM表征了薄膜的晶相和形貌特征,用接触角测定仪测定接触角以评估薄膜的亲水性,以甲基橙作为有机污染物研究了薄膜的光催化性能.实验结果发现:少量Ni2+掺杂提高了TiO2薄膜的亲水性和光致亲水性.但Ni2+掺杂却使TiO2先催化性能有所降低.结果表明,TiO2薄膜表面的光致亲水性与光催化特性无正相关性.  相似文献   

6.
在通过溶胶-凝胶法制备出铜和氮共掺杂的纳米二氧化钛(TiO2)的基础上,利用XRD和UV-Vis光谱等技术对其结构、掺杂效果、光催化活性等进行了表征,结果表明,掺入了铜和氮的纳米TiO2结构为锐钛矿晶型,其吸收阈值达到590nm,可见光吸收率比未掺杂的纳米TiO2有了很大提高,最终导致其光催化降解二甲酚橙的活性得到显著增强.  相似文献   

7.
综述了纳米TiO2光催化自洁原理、纳米TiO2制备方法及改性方法,同时也介绍纳米TiO2光催化自洁技术的研究现状和发展趋势。  相似文献   

8.
综述了纳米TiO2光催化自洁原理、纳米TiO2制备方法及改性方法,同时也介绍纳米TiO2光催化自洁技术的研究现状和发展趋势.  相似文献   

9.
采用溶胶-凝胶法制备了以铝片为载体的掺杂La的TiO2薄膜.以甲基橙模拟有机污染物,研究了焙烧温度、不同光源、光照时间等对其光催化性能的影响.结果表明,400℃的焙烧温度光催化性能最好.在纳米TiO2中掺杂La进行修饰,当掺杂量为0.7%时其光催化效率有了明显的提高.紫外灯照射2 h后,催化剂对甲基橙的降解率为97.63%,优于可见光.  相似文献   

10.
通过液相沉积法在较低的温度下制备了TiO2/SiO2复合薄膜,利用UV-Vis、XRD和SEM等表征手段对薄膜的透明性、物相和表面形貌进行了表征;并在紫外光照下,通过薄膜对罗丹明B水溶液的光催化降解实验,评价了沉积薄膜的光催化活性.实验结果表明,在室温下制备的液相沉积膜具有较好的光催化活性.  相似文献   

11.
电火花沉积工艺(ESD)是一种微弧焊工艺,电极材料沉积到基体表面,并于基体呈冶金结合.本文以冷作模具钢Cr12MoV为基体材料,利用电火花沉积对局部区域进行修复.研究了影响沉积层质量和沉积率的工艺参数,其中包括电容、电压和保护气.实验结果显示,虽然随着电容和电压的增大,沉积率提高,但同时也会使沉积层中的微裂纹和孔洞增加.因此,只有合理选择沉积工艺参数,才能达到一定沉积率的同时保证沉积层的质量.  相似文献   

12.
A novel metallo-organic chemical vapor deposition (MOCVD) technique has been applied to the preparation of the photocatalytic titanium dioxide supported on activated carbon. The effects of various condition parameters such as carrier gas flow rate, source temperature and deposition temperature on the deposition rate were investigated. The maximum deposition rate of 8.2 mg/(g.h) was obtained under conditions of carrier gas flow rate of 400 ml/min, source temperature of 423 K and deposition temperature of 913 K. The deposition rate followed Arrhenius behavior at temperature of 753 K to 913 K, corresponding to activation energy Ea of 51.09 kJ/mol. TiO2 existed only in anatase phase when the deposition temperature was 773 K to 973 K. With increase of deposition temperature from 1073 K to 1273 K, the rutile content sharply increased from 7% to 70%. It was found that a deposition temperature of 773 K and a higher source temperature of 448 K resulted in finely dispersed TiO2 particles, which were mainly in the range of 10-20 nm.  相似文献   

13.
A novel metallo-organic chemical vapor deposition (MOCVD) technique has been applied to the preparation of the photocatalytic titanium dioxide supported on activated carbon. The effects of various condition parameters such as carrier gas flow rate, source temperature and deposition temperature on the deposition rate were investigated. The maximum deposition rate of 8.2 mg/(g·h) was obtained under conditions of carrier gas flow rate of 400 ml/min, source temperature of 423 K and deposition temperature of 913 K. The deposition rate followed Arrhenius behavior at temperature of 753 K to 913 K, corresponding to activation energy E a of 51.09 kJ/mol. TiO2 existed only in anatase phase when the deposition temperature was 773 K to 973 K. With increase of deposition temperature from 1073 K to 1273 K, the rutile content sharply increased from 7% to 70%. It was found that a deposition temperature of 773 K and a higher source temperature of 448 K resulted in finely dispersed TiO2 particles, which were mainly in the range of 10–20 nm. Project (No. 90206007) supported by the National Natural Science Foundation of China  相似文献   

14.
本文采用溶胶—凝胶法先在铸件表面涂覆一层TiO2薄膜,再对铸件进行化学镀Ni—P处理。研究表明,TiO2涂层可以有效减小铸件表面的孔隙率,弥补了Ni—P镀层直接覆盖在铸件表面易产生针孔的缺陷。与现有的铸件表面处理方法相比,本工艺改善了铸件的耐腐蚀性,而且较大地提高了沉积速率。在不增加过多成本的情况下,还节约了能源。  相似文献   

15.
报道了紫外光源在制备金属薄膜材料方面的应用研究,金属钯是一种优良的催化剂,首先在各种衬底上面淀积靶的金属有机化合物薄膜,通过紫外分解钯的金属有机化合物,形成数埃到几十埃的色膜,然后再利用钯的催化效应,在无电极电镀中淀积出几十纳米到几微米厚的各种金属薄膜(如Cu、Au、Ni等)。  相似文献   

16.
Nano-particles lanthanum-modified lead titanate (PLT) thin films are grown on Pt/Ti/SiO2/Si substrate by liquid source misted chemical deposition (LSMCD). PLT films are deposited for 4-8 times, and thenannealed at various temperature. XRD and SEM show that the prepared films have good crystallization behavior and perovskite structure. The crystallite is about 60nm. The deposition speed is 3nm/min. This deposition method can exactly control stoichiometry ratios, doping concentration ratio and thickness of PLT thin films. The best annealing process is to bake at 300℃ for 10min and anneal at 600℃ for 1h.  相似文献   

17.
This paper reviews recent progress in electrophoretic deposition (EPD), particularly in solid oxide fuel cells (SOFCs). EPD is a simple, cost-effective, and geometrical flexible colloidal process. With its excellent control of thickness and other morphological characteristics, it is favored for the fabrication of SOFCs because each component layer of an SOFC has different requirements. However, the effectiveness of EPD is closely related to the suspension stability and EPD processing parameters. Maintaining a stable suspension and optimizing the EPD processing parameters are essential to achieve a dense and uniform deposition layer. Key parameters in maintaining the suspension stability are generally categorized into colloidal related parameters, including particle size and solid loading, and suspension media related parameters, including dielectric constant and conductivity. The effects of these parameters are often reflected by the zeta potential of the suspension, which can be manipulated by using charging agents to maintain a stable state. The deposition time and applied voltage are key parameters in optimizing the EPD process through their effects on the deposition rate. The effects of these parameters on particle surface charges and on the EPD mechanism are discussed.  相似文献   

18.
1 Introduction Becauseofthecombinationofanumberoffavorableproperties,suchashighhardness,highcarriermobilityandbreakdownvoltage,largebandgap ,lowdielectricconstant,andtransparencytovisiblelight,IRlightandmicrowaves,etc.[1] ,diamondfilmhasbeenconsider ablyprom…  相似文献   

19.
区域水资源合理配置问题是一个多目标决策问题.文巾在分析区域水资源合理配置基本内涵的基础上,探讨了水资源配置的原则及目标,对基于经济目标、环境目标与社会目标的水资源多目标合理配置模型进行了较为深入的分析,探讨了模型的求解方法.可为区域水资源多目标合理配置定量分析提供理论指导,具有较为重要的理论与实践意义.  相似文献   

20.
Effect of water and sediment regulation on lower Yellow River   总被引:1,自引:0,他引:1  
According to the results of the water and sediment regulations of the Yellow River in year 2002-2007, the effect of erosion and deposition on the lower reaches, the amount and distribution of erosion and deposition in the river mouth area, the adjustment of river regime, the effect of river regulation projects and changes of flowing capacity of the channel are analyzed. It is revealed that the water and sediment regulation is efficient to reduce deposition and improve the flowing capacity and the conditions of sediment transport.  相似文献   

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