溅射气压对Ti/Al多层膜结构和热稳定性的影响

为研究Ti/Al多层膜的结构和热稳定性与溅射气压的关系,采用对向靶直流磁控溅射法在0.5、2.0 Pa的溅射气压下制备了Ti/Al软X射线光学多层膜(Λ=9.25 nm,Г=0.3,N=20),并采用低角度X射线衍射、高角度X射线衍射和原子力显微镜对其结构和热稳定性进行表征.发现:低溅射气压(0.5 Pa)下制备的多层膜具有相对高质量、有序的结晶层,导致了相对较小的表面粗糙度,热稳定性好;高溅射气压(2.0 Pa)下制备的多层膜周期性结构相对较差,晶向较为无序,表面粗糙度较大,结构热稳定性差.可见,Ti/Al多层膜的结构和热稳定性是溅射气压的函数,低溅射气压下制备的多层膜会获得更好的结构和热稳定性.     

透明电极薄膜的制备及其电阻率测量普通物理实验

介绍了如何把“透明电极薄膜的制备及其电阻率测量”的实验引入到普通物理实验教学中,用简单的直流溅射镀膜仪制备不同厚度的金属氧化物透明电极薄膜(ZnO:A l薄膜),并用四探针测量了它们的电阻率。该实验是对已经在北京科技大学国家工科物理基础课程教学基地开设的大学生普通物理实验内容的新扩充[1]。     

CoSiN薄膜的制备

文章采用磁控溅射的方法在n型硅基底上制备了CoN和SiN薄膜,再用薄膜测厚仪和四探针测试仪(EPP)测出样品的厚度及方块电阻,得到制备CoN和SiN薄膜的优化条件,然后由CoN和SiN薄膜制备出CoSiN薄膜.     

高介电HfOxNy薄膜的表面形貌及光学特性研究

采用射频反应磁控溅射氧化铪钯的方法,在硅衬底成功制备了高介电HfOxNy薄膜．利用原子力显微镜,研究氮的掺入对薄膜表面形貌的影响,结果表明,N的掺杂改善了HfO2薄膜的表面形貌,同时抑制了高温退火过程中表面粗糙度的增加;通过椭圆偏振仪对薄膜的光学特性的研究表明,随退火温度的升高,薄膜的折射率和消光系数都呈上升趋势．     

Preparation of AIN thin films for film bulk acoustic resonator application by radio frequency sputtering

Aluminum nitride (AIN) thin films with high c-axis orientation have been prepared on a glass substrate with an A1bottom electrode by radio frequency (RF) reactive magnetron sputtering. Based on the analysis of Berg's hysteresis model, the improved sputtering system is realized without a hysteresis effect. A new control method for rapidly depositing highly c-axis oriented AIN thin films is proposed. The N2 concentration could be controlled by observing the changes in cathode voltage, to realize the optimum processing condition where the target could be fixed stably in the transition region, and both stoichiometric film composition and a high deposition rate could be obtained. Under a 500 W RF power of a target with a 6 cm diameter, a substrate temperature of 450 ℃, a target-substrate distance of 60 mm and a N2 concentration of 25%, AIN thin film with prefer-ential (002) orientation was deposited at 2.3 μm/h which is a much higher rate than previously achieved. Through X-ray diffraction (XRD) analysis, the full width at half maximum (FWHM) of AIN (002) was shown to be about 0.28°, which shows the good crystallinity and crystal orientation of AIN thin film. With other parameters held constant, any increase or decrease in N2 con-centration results in an increase in the FWHM of AIN.     

Cu在CoN和CoSiN薄膜中的扩散研究

利用磁控溅射的方法在n型硅基底制备了Cu／CoN／Si（100）和Cu／CoSiN／Si（100）薄膜,并对它们进行了不同温度的退火．用原子力显微镜观察了它们的表面形貌．用扫描透射电镜能谱分析法得到了在不同退火温度下铜在上面两种薄膜中浓度与表面距离的分布,然后利用菲克第二定律对Cu／CoN／Si和Cu／CoSiN／Si体系中cu的扩散进行了计算和分析,得出中温条件（300℃-700℃）下Cu在CoN和CoSiN两种薄膜中的扩散系数表达式分别为8．98×10^-13exp（-0．45eV／kT）cHf／s和5．39×10^-11exp（-0．49eV／kT）Cm2／s．     

Microstructure and corrosion resistance of sputtered TiN coatings on surface of Zr-4 alloy

To improve the oxidation resistance and corrosion resistance of Zr-4 alloy, titanium nitride(TiN) coatings were prepared on the Zr-4 alloy with a TiN ceramic target with different ratios of N_2. Microstructure and high-temperature properties of the TiN coated samples were studied by scanning electron microscopy(SEM), energy dispersive spectrometer(EDS), X-ray diffraction meter(XRD), X-ray photoelectron spectroscopy(XPS), heat treatment furnace and autoclaves, respectively. The x value of the TiN coatings(TiN_x) ranges from 0.96 to 1.33. After the introduction of N_2, TiN coating exhibits a weak(200) plane and a preferred(111) orientation. The coating prepared with an N_2 flow ratio of 15% shows an optimal oxidation resistance in the atmospheric environment at 800 °C. In either 1 200 °C steam environment for one hour, or deionized water at 360 °C and a pressure of 18.6 Mpa for 16 d, the opitimized TiN coated samples have no delamination or spallation; and the gains in the masses of samples are much smaller than Zr-4 alloy. These results demonstrate the effectiveness of the optimized TiN coating as the protective coating on the Zr-4 alloy under extreme conditons.     

双层透明薄膜制备及氧含量对折射率影响研究

利用磁控溅射技术在玻璃基片上分别沉积ZnOx薄膜、TiO2-y薄膜和TiO2-y/ZnOx双层透明薄膜,改变薄膜沉积过程中的氩气(Ar)和氧气((O2)的比例,获得具有不同氧含量的ZnOx薄膜和TiO2-y薄膜.采用椭偏仪测定所有样品的折射率,仔细研究薄膜中氧含量对折射率的影响.分别选择具有较大的折射率TiO2-y薄膜和具有较小的折射率ZnOx薄膜的生长条件,制备TiO2-y/ZnOx双层薄膜,获得光密媒质/光疏媒质双层结构,并观察到He-Ne激光从ZnOx薄膜入射到TiO2-y/ZnOx界面上发生的全反射现象.研究成果适用于大学生物理实验中的研究型实验或大学创新实验.     

衬底温度对Zn0.95Ca0.05O薄膜结构和光学性质的影响

利用磁控溅射法在玻璃基片上制备Zn0.95Ca0.05O薄膜,用X射线衍射(XRD)研究薄膜的结构特性,用LS920荧光光谱仪测量了样品薄膜的PL谱,探讨了衬底温度对薄膜结晶质量和光学性质的影响。研究发现,衬底温度对薄膜的质量影响较小,450℃时制备的薄膜结晶质量最好;不同衬底温度对发光峰强度有影响;薄膜在可见光区显示出较高的透过性,在350-400 nm范围内薄膜透过率骤然下降,在该范围内存在吸收边。     

合金靶材择优溅射的SRIM模拟研究

利用SRIM2013软件,分别模拟计算了3组合金靶材Fe-Cr、Cu-Ni和Au-Ag在氩离子入射时的溅射产额,根据计算结果得出3组合金均存在择优溅射现象,择优溅射与金属原子的表面结合能有关的结论。同时模拟了 Au-Ag合金的溅射产额随入射离子能量和合金成分的变化情况,并分析其择优溅射机制。