基于离子蚀刻技术实现石英晶振的频率微调

近年来随着机器的小型化、成本的降低,各石英晶振生产企业不断追求生产效率的提高以及精度的提高.在石英晶振生产过程中,目标频率的微调较大程度影响着石英晶振的精度.应用石英晶振的原理,基于蚀刻技术实现石英晶振的频率微调,从而提高石英晶振的精度.     

Application of colour metallography in the examination of ancient metals

The use of colour in the metallographic examination of ancient metals is useful both for research and teaching purposes. Application of different optical methods of examination include: polarized light, with or without a first-order red compensator, and differential interference contrast microscopy (DIC). The use of DIC can be combined with the other techniques mentioned in the text for the examination of etched or unetched metal surfaces, which are best observed microscopically using a metallograph. Colour techniques are now used routinely in industrial metallography, and are available for a variety of metals and alloys. Colour tint etching can be used to enhance grain structure or different phases present in the metallic artefact which may not be visible in conventional etched samples, or which lack optical contrast. Many more applications of these techniques in the examination of ancient metals will be published in the literature as they become better known and second-hand equipment with DIC lenses enter the market at a price suitable for conservation laboratories to purchase them.     

In situ growth of large-area and self-aligned graphene nanoribbon arrays on liquid metal

Intrinsic graphene features semi-metallic characteristics that limit its applications in electronic devices, whereas graphene nanoribbons (GNRs) are promising semiconductors because of their bandgap-opening feature. However, the controllable mass-fabrication of high-quality GNR arrays remains a major challenge. In particular, the in situ growth of GNR arrays through template-free chemical vapor deposition (CVD) has not been realized. Herein, we report a template-free CVD strategy to grow large-area, high-quality and self-aligned GNR arrays on liquid copper surface. The width of as-grown GNR could be optimized to sub-10 nm with aspect ratio up to 387, which is higher than those of reported CVD-GNRs. The study of the growth mechanism indicates that a unique comb-like etching-regulated growth process caused by a trace hydrogen flow guides the formation of the mass-produced self-aligned GNR arrays. Our approach is operationally simple and efficient, offering an assurance for the use of GNR arrays in integrated circuits.     

TCAD在“半导体工艺”课程中应用的教学探讨

分析了TCAD技术的主要功能,探讨其在“半导体工艺”课程教学中的应用。并以半导体工艺中的蚀刻为例,利用TCAD技术中ATHENA工艺仿真模块,对比了湿法蚀刻和干法蚀刻的特点。     

自制扫描隧道显微镜探针尖的比较研究

探针对扫描隧道显微镜成像起至关重要的作用。本文分别对电化学腐蚀法自制的钨丝探针和剪切法制得的铂铱探针进行扫描光栅图像比较分析。结果表明,相比铂铱探针,钨丝探针虽然制备繁琐,反应条件不易控制,但是尖锐轴对称形的钨丝探针扫描样品形貌更加细微,用作扫描隧道显微镜探针时扫描成像质量高。该研究为扫描隧道显微镜探针的选用提供了依据。     

电化学腐蚀法制备扫描隧道显微镜针尖曲率半径最佳参数的研究

研究了电化学腐蚀法制备扫描隧道显微镜钨针尖过程中,腐蚀电压、浸入深度、偏离角度、溶液浓度、切断时间对针尖曲率半径的影响,结果表明当电压V=9.5V的情况下,浸入深度在1.5-2mm范围内,偏离角度〈1°,溶液浓度在2mol/L,切断时间在500m s以下,腐蚀后得到的钨针尖的曲率半径达到最佳值.     

A novel colloid probe preparation method based on chemical etching technique

Several fundamental problems in hydrophobic force measurements using atomic force microscope （AFM） are discussed in this paper. A novel method for colloid probe preparation based on chemical etching technology is proposed, which is specially fit for the unique demands of hydrophobic force measurements by AFM. The features of three different approaches for determining spring constants of rectangular cantilevers, including geometric dimension, Cleveland and Sader methods are compared. The influences of the sizes of the colloids on the measurements of the hydrophobic force curves are investigated. Our experimental results showed that by selecting colloid probe with proper spring constant and tip size, the hydrophobic force and the complete hydrophobic interaction force curve can be measured by using AFM.     

Effect of annealing on wet etch of amorphous IGZO thin film

Amorphous InGaZnO (a-IGZO) film is deposited on the glass substrate by radio-frequency sputtering and the influence of annealing on wet etch of a-IGZO films were investigated. The results show that etch rate of IGZO films decrease with the increase of annealing temperature. Etching taper angle is less than 60° and critical dimension (CD) loss is less than 1 μm in over-etching time of 30 s. The fact implies that IGZO films etching with oxalic acid may be a good wet etching way for the thin-film transistor (TFT) array process.     

Effect of annealing on wet etch of amorphous IGZO thin film

Amorphous InGaZnO (a-IGZO) film is deposited on the glass substrate by radio-frequency sputtering and the influence of annealing on wet etch of a-IGZO films were investigated.The results show that etch rate of IGZO films decrease with the increase of annealing temperature.Etching taper angle is less than 60 and critical dimension (CD) loss is less than 1 μm in over-etching time of 30 s.The fact implies that IGZO films etching with oxalic acid may be a good wet etching way for the thin-film transistor (TFT) ...     

通向铜版画的圣殿——论陈晓南先生的艺术成就

本文论述了西方铜版画在中国的引进与传播过程，评价了以陈晓南为代表的中国铜版画创作的艺术成就，以及他对版画教学研究的贡献。