Quantum lithography: A?non-computing application of quantum information |
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Authors: | Colin Williams Pieter Kok Hwang Lee and Jonathan P Dowling |
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Institution: | (1) Jet Propulsion Laboratory, California Institute of Technology, 4800 Oak Grove Drive, 91109–8099 Pasadena, CA, USA;(2) Department of Materials, Oxford University, Oxford University Parks Road, OX1 3PH Oxford, UK;(3) Department of Physics & Astronomy, Louisiana State University, 202 Nicholson Hall, Tower Drive, 70803–4001 Baton Rouge, LA, USA |
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Abstract: | Quantum information theory holds the promise of revolutionizing technologies other than computing
and communications. In this article we show how quantum entanglement can be harnessed to beat the Rayleigh
diffraction limit of conventional optical lithography, and to permit nano-devices to be fabricated at a scale
arbitrarily shorter than the wavelength used. Given the relative ease of performing optical lithography
compared with other schemes, and the relative costs associated in migrating the lithography industry to
each new fabrication technology, exploiting quantum entanglement to extend the useful life of optical lithography
could be economically attractive. |
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