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| 沉积时间对非晶碳/Mo_2C混合薄膜场发射性能的影响 | |
| 引用本文： | 王朝勇,孙广,姚宁.沉积时间对非晶碳/Mo_2C混合薄膜场发射性能的影响[J].新乡师范高等专科学校学报,2007,21(5):48-50. |
| 作者姓名： | 王朝勇 孙广 姚宁 |
| 作者单位： | 1. 平顶山工学院,数理系物理教研室,河南,平顶山,467001 2. 河南质量工程职业学院,基础部,河南,平顶山,467001 3. 郑州大学,材料物理教育部重点实验室,河南,郑州,450052 |
| 基金项目： | 教育部科学技术研究重点项目 |
| 摘 要： | 在Al2O3衬底上采用微波等离子体增强化学气相沉积(MPCVD)系统中沉积薄膜,反应气体为CH4、H2。从样品的Raman谱中可以分析出薄膜中含有非晶碳成分。XRD有明显的晶态Mo2C衍射峰,所制备的薄膜为非晶碳/Mo2C混合膜。在高真空室中测量了样品的场发射特性,其开启场强为0.55 V/μm,在1.8 V/μm电场下测得样品的场发射电流密度为6.8 mA/cm2。CCD图中可以看到样品有比较好的发光特性。研究了在一定反应条件下,沉积时间对样品场发射特性的影响,4 h制备的样品场发射性能最好。良好的场发射性能决定了所制备的样品是一种好的场致发射体。 |
| 关 键 词： | 场发射 微波等离子体化学气相沉积 非晶碳 Mo2C |
| 文章编号： | 1008-7613（2007）05-0048-03 |
| 修稿时间： | 2007-04-05 |
Impact of Deposition Time on Field Emission Characters of Compound Film of Amorphous Carbon and Mo2C |
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| WANG Zhao-yong,SUN Guan,YAO Ning.Impact of Deposition Time on Field Emission Characters of Compound Film of Amorphous Carbon and Mo2C[J].Journal of Xinxiang Teachers College,2007,21(5):48-50. | |
| Authors: | WANG Zhao-yong SUN Guan YAO Ning |
| Institution: | 1. Pingdingshan Institute of Technology, Pingdingshan 467001, China; 2. Henan Vocational Institutc of Quality Engineering, Pingdingshan 467001, China; 3. Laboratory of Materials Physics and Department of Physics , Zhengzhou University, Zhengzhou 450052, China |
| Abstract: | The film was deposited on Al2O3 substrate in microwave plasma chemical vapor deposition system with The reactive gases of CH4 and H2. The microstructure and ingredient were studied by using Raman spectrum and X-ray diffraction(XRD).Field emission characteristics was measured in high vacuum chamber.Its turn-on.electric field was 0.55v/μm.The film contains amorphous carbon and Mo2C.We studied th impaction of reaction time on its field emission characteristics.The right time was 4 hours.It could be a good kind of field electron emitter. |
| Keywords: | Mo2C |
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