ZnO薄膜的电化学沉积及其性能研究

以透明导电玻璃(TCO)为衬底,用硝酸锌水溶液作为电解液,采用阴极电沉积法合成了ZnO薄膜.通过改变电解液浓度、温度和沉积电压等实验条件,系统研究了锌氧化物薄膜材料的电化学沉积过程.用扫描电镜、X射线衍射、紫外-可见光谱法等技术对沉积物的形貌、结构及光学性质进行了表征.结果表明,通过控制电解液的浓度和温度及沉积电压等反应条件可以制备出不同形貌的ZnO薄膜.XRD结果表明,所得的ZnO纯度高且呈六方纤锌矿结构;光谱法研究表明,该薄膜在344 nm和552 nm处有两个吸收峰,禁带宽度为3.25 eV.

Electrochemical deposition and characterization of Zinc oxide thin films

ZnO thin film is galvanostatically electrodeposited from an aqueous solution of Zn （NO3 ）2 on transpar- ent conducting glass substrate which is cathode. The electrodeposition process of ZnO thin film is systematically studied when changing deposition conditions such as electrolyte concentration , temperature and deposition volt- age ,etc. The morphology, structure and optical property of deposit,~ are characterized by scanning electron mi- croscopy（SEM） , X-ray diffraction （XRD） and UV-Vis transmissior, spectra. The results indicate that the mor- phology of the films are related with deposition conditions. XRD analysis demonstrates that the ZnO thin film has phase purity and wurtzite structure, optical characterizations show that such film has two absorption peaks at 344 nm and 552 nm, respectively and its band gap energy is 3.25 eV.