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Near-UV laser interaction with contaminants and pigments on parchment: laser cleaning diagnostics by SE-microscopy,VIS-, and IR-spectroscopy
Institution:1. Department of Electrical & Electronic Engineering, Rajshahi University of Engineering & Technology, Rajshahi-6204, Bangladesh;2. DTU Fotonik, Department of Photonics Engineering, Technical University of Denmark, DK-2800, Kgs. Lyngby, Denmark;1. Loughborough University, Loughborough, United Kingdom;2. University of Sierra Leone, Freetown, Sierra Leone
Abstract:Potentials and limitations of the near-UV pulsed laser cleaning of parchment (wavelength 308 nm, pulse duration 17 ns) are demonstrated by the application of scanning electron microscopy (SEM), colour metrics and diffuse reflectance infrared Fourier transform spectroscopy (DRIFT) at model contamination/pigment/parchment systems. Pigment-binder systems stable and unstable against near-UV laser treatment could be identified. A chemical degradation threshold fluence of a goat parchment model substrate was determined which practically coincided with its ablation threshold fluence. This indicates that the fluence range of destructionless laser cleaning at 308 nm is almost not impaired by chemical modfications below the ablation limit. Nevertheless, spectroscopic diagnostics are necessary to guarantee destructionless cleaning for practical cases where the chemical conversion threshold fluence deviates from the ablation threshold to lower values.
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