| 离子束辅助沉积镍铬合金膜研究 |
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| 引用本文： | 王益军,严诚,邓光绪,李军国,杨玲.离子束辅助沉积镍铬合金膜研究[J].咸阳师范学院学报,2007,22(4):18-20. |
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| 作者姓名： | 王益军 严诚 邓光绪 李军国 杨玲 |
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| 作者单位： | 1. 咸阳师范学院,物理系,陕西,咸阳,712000
2. 北方夜视技术股份有限公司,北京,100089 |
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| 基金项目： | 国家部委资助项目;咸阳师范学院校科研和教改项目 |
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| 摘 要： | 分析了电子束沉积镍铬合金膜沉积的主要缺点,提出离子辅助电子束法沉积镍铬合金膜的新方法。利用氩离子辅助在微通道板表面沉积了镍铬合金膜,对比和分析了使用氩离子辅助沉积和电子束沉积薄膜的性质(附着力、致密性、表面电阻等)。结果表明,使用250eV的氩离子源辅助沉积的镍铬合金膜附着力好、结构致密、表面电阻低。
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| 关 键 词： | 离子束辅助沉积 微通道板 Ni-Cr膜 附着力 |
| 文章编号： | 1672-2914（2007）04-0018-03 |
| 修稿时间： | 2007-04-20 |
Research on Ion Beam Assisted Ni-Cr Film Deposition |
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| WANG Yi-jun,YAN Cheng,DENG Guang-xu,LI Jun-guo,YANG Ling.Research on Ion Beam Assisted Ni-Cr Film Deposition[J].Journal of Xianyang Normal University,2007,22(4):18-20. |
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| Authors: | WANG Yi-jun YAN Cheng DENG Guang-xu LI Jun-guo YANG Ling |
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| Institution: | 1. Department of Physics, Xianyang Normal University, Xianyang ,Shaanxi 712000; 2. North Night Vision Technology Co. LTD ,Beijing 100089,China |
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| Abstract: | Main defects of electron beam vapor deposition of Ni-Cr(80-20)film were analyzed.Ion beam assisted deposition(IBAD) was put forward.Ni-Cr film was deposited on surface of Microchannel plate by Ar IBAD.The character(adhesion force,accumulate,surface resistance and so on) of film which deposited by electron beam vapor deposition and IBAD were compared and analyzed.The results indicate: by 250eVAr IBAD,the film had a good adhesion force,compact accumulate,and low surface resistance. |
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| Keywords: | Ion beam assisted deposition Microchannel plate Ni-Cr film adhesion force |
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