Photoresists for microlithography |
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| Authors: | Debmalya Roy P K Basu S V Eswaran |
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| Institution: | 1.Solid State Physics Laboratory,Delhi,India;2.Deshbandhu College,University of Delhi,Kalkaji New Delhi,India |
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| Abstract: | Photoresist technology, which is used for micro-patterning exploits changes in properties of polymeric materials, such as their solubility or volatility, upon photo-irradiation. This process has greatly benefitted from the knowledge base of organic chemistry and photo-induced organic transformations. The role of chemistry in the development of photoresists is described in this article. |
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