信息技术领域专利维持状况及影响因素研究

探讨将生存分析应用至专利维持研究的适用性和有效性。运用生存分析中的生存函数和cox分层回归模型,针对中国1985-2009年间信息技术领域发明专利数据,确定领域专利维持时间分布、比较不同国别申请人维持状况,并量化影响专利维持的风险因素。研究发现:信息技术领域专利的中位生存期约为10.5年,仅有接近1%的专利维持到届满;美国申请人专利维持情况最好,中国申请人的维持时长总体偏低,但有部分专利始终能够得到市场的认可;申请授权时间、发明人数量、申请人数量、申请书页数对专利维持的影响依次降低。

Research on Patent Maintenance and Its Influencing Factors in the Field of Information Technology

This paper discusses the applicability and effectiveness when survival analysis is applied to the study of patent maintenance. The authors investigate the entire invention patents of China in information technology field from 1985 to 2009 by using the survival function and stratified cox regression model, in order to determine its distribution of maintenance period and compare patent maintenance status between applicants from different countries and quantify the impact of risk factor. The results show that the median survival period in information technology field is approximately 10.5 year, only 1% patents maintain until expiration; The maintenance status of American applicants remains the best, while the overall maintenance period of Chinese applicants is the shortest with the exception that some patents keep the acceptance of market for a long time; The type of patent applicants, authorization year, the number of inventors, the number of applicants, and the page number of the application form influence patent maintenance in a successively decreasing way.