| CoSiN薄膜的制备 |
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| 引用本文： | 张在玉,陈秀华,冯春杰.CoSiN薄膜的制备[J].安顺师范高等专科学校学报,2013,15(4):115-116,129. |
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| 作者姓名： | 张在玉 陈秀华 冯春杰 |
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| 作者单位： | 1. 安顺学院物理与电子科学系,贵州 安顺,561000
2. 云南大学材料科学与工程系,云南 昆明,650091 |
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| 摘 要： | 文章采用磁控溅射的方法在n型硅基底上制备了CoN和SiN薄膜,再用薄膜测厚仪和四探针测试仪(EPP)测出样品的厚度及方块电阻,得到制备CoN和SiN薄膜的优化条件,然后由CoN和SiN薄膜制备出CoSiN薄膜.
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| 关 键 词： | 磁控溅射 CoN和SiN薄膜 CoSiN薄膜 |
Preparation of CoSiN Films |
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| Zhang Zaiyu
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Chen Xiuhua
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Feng Chunjie.Preparation of CoSiN Films[J].Journal of Anshun Teachers College,2013,15(4):115-116,129. |
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| Authors: | Zhang Zaiyu Chen Xiuhua Feng Chunjie |
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| Institution: | 3 (l. 3. Department of Physics and Electronic Science, Anshun University, Anshun561000, Guizhou, China) (2. Department of Materials Science and Engineering, Yunnan University, Kunming650091, Yunnan, China) |
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| Abstract: | In this paper, CoN and SiN films were prepared on n-type silicon substrate by magnetron sputtering. Then these samples were tested by film thickness apparatus and four-probe resistance apparatus （FPP） to measure their thickness and square resistance. The optimized conditions of CoN and SiN films were obtained. CoSiN films were made from CoN and SiN film. |
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| Keywords: | megnetron sputtering Con and Sin film Cosin film |
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