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铝掺杂氧化锌薄膜的制备及其特性
引用本文:庄小玲,冷金亮,张治国.铝掺杂氧化锌薄膜的制备及其特性[J].泉州师范学院学报,2010,28(2):27-31.
作者姓名:庄小玲  冷金亮  张治国
作者单位:泉州师范学院物理与信息工程学院,福建,泉州,362000
摘    要:采用直流反应磁控溅射法,制备了铝掺杂的氧化锌薄膜.结果显示:薄膜在500℃退火后透光率高,光敏特性良好,并且有明显的紫外光响应.其XRD衍射谱表明随着O2与Ar流量比的增加,对应于(002)晶面的衍射峰趋于尖锐,c轴取向突出明显.

关 键 词:磁控溅射  AZO薄膜  XRD谱

Preparation and Characterization of Al-doped ZnO Thin Film
ZHUANG Xiao-ling,LENG Jin-liang,ZHANG Zhi-guo.Preparation and Characterization of Al-doped ZnO Thin Film[J].Journal of Quanzhou Normal College,2010,28(2):27-31.
Authors:ZHUANG Xiao-ling  LENG Jin-liang  ZHANG Zhi-guo
Institution:ZHUANG Xiao-ling,LENG Jin-liang,ZHANG Zhi-guo(School of Science , Engineering,Quanzhou Normal University,Fujian 362000,China)
Abstract:ZnO Al-doped thin films are prepared using the DC reactive magnetron sputtering,the ratio of oxygen and argon gas flow is given,the experiment finds that the transmittance of AZO thin films is high,the photosensitivity is good,and there is a clear response to UV after annealed at 500 ℃.In addition,the experiment proves the(002) crystal face diffraction peaks become sharp with the O2∶Ar flow ratio increases,the c-axis orientation is sharper and more evident.
Keywords:DC magnetron sputtering  AZO thin film  XRD spectrums  
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